Re: Al2O3 patterning
From: Uncle Al (UncleAl0_at_hate.spam.net)
Date: 09/27/04
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Date: Mon, 27 Sep 2004 09:12:50 -0700
Nima wrote:
>
> Hi,
>
> I want to etch Al2O3 but I can not pattern it because photoresist
> stick to and don't remove enough in exposed areas. Can anyone help me
> in choosing another masking material or changing process parameters to
> solve this?
Clean alumina surfaces can be altered with functional silanizing
agents,
Dial in a surface monolayer (or less) of what you need.
-- Uncle Al http://www.mazepath.com/uncleal/ (Toxic URL! Unsafe for children and most mammals) http://www.mazepath.com/uncleal/qz.pdf
- Previous message: Nima: "Al2O3 patterning"
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