Re: CVD thick teflon
- From: atomweaver <atomweaver@xxxxxxxxxxx>
- Date: Fri, 08 Jun 2007 16:16:14 GMT
slibon@xxxxxxxxx wrote in news:1181289422.978674.106840
@w5g2000hsg.googlegroups.com:
Mark Thorson a écrit :
slibon@xxxxxxxxx wrote:I thought of that (did not tried though) but would the coating be non-
Hello,
I am looking for a process to deposit a thick (50µm and more)
conformal coating of teflon (or any other high temp polymer) on a
polyimide substrate. The process should not raise the temperature of
the substrate above 100°C. CVD and PECVD is used for low-k teflon on
wafers but these guys work on thin films (below the µm). Any
sources...??
You dissolve Teflon powder in Fluorinert, coat,
then bake off the Fluorinert. Several of the
attempts to make substrates for moving droplets
around (for microchemistry) have used this
approach to make a hydrophobic surface.
There are several different Fluorinerts.
You'll probably need the lightest one to stay
below 100C.
porous. I guess I still will have some kind of powder dispertion?
Porosity/pinhole would kill the dielectric strength. Can you confirm/
deny? Thanks anyway
What are your performance requirements for the coating, post-application?
If it cannot be porous, and you need 2 mils, does it have to be CVD?
I've got a polyamide/imide urethane diacrylate resin with a dielectric
constant of 3.4 (and outstanding adhesion to Kapton), a silicone urethane
diacrylate with "E" of 2.3, and a polyBD urethane diacrylate with "E" of
1.8, each of which can be further diluted in acrylate monomers, add some
PI, and UV cure, which'll keep your substrate cool as a cucumber (30 to 35
degC, max).
Regards,
R. David Zopf
davidz@xxxxxxxxxxxxxxxxxxxx
.
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