Re: SEM question/advice, best FE SEM?
From: Dev Null (devnull_at_foo.bar)
Date: 09/30/04
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Date: 30 Sep 2004 01:30:42 GMT
Gary G <see.signature@bottom> wrote in
news:0b4ml0t7tlr8jof5gan749jiu5oq3323n7@4ax.com:
> On 28 Sep 2004 02:30:45 GMT, Dev Null <devnull@foo.bar> wrote:
>
> >
> >Hello,
> >
> >My company wants to buy a high resolution SEM. I've looked
> >briefly at Zeiss, Hitachi, and JEOL.
> >
> >I've been told that FE is the way to go but cold FE isn't worth
> >the trouble.
> >
> >We will be looking at a wide variety of samples, especially
> >photoresist on silicon wafers.
> >
> >I've used a JEOL-35C and a Hitachi 3500H.
> >
> >I would appreciate any suggestions on manufacturers or models.
> >
> >Thanks
>
> If you are looking at diced wafers, that is one factor. If you
> are looking at whole wafers, that changes things a bit. Are you
> coating the specimens? What is high resolution for your work?
>
> Cold FE will produce high rez images. The issue with them is
> that the tips need flashing once or twice a day. The other
> factor is that they are not really stable for long imaging times
> like EDS maps or EBSD. Thermal FE systems are very stable.
> Plus, they can produce much higher probe current.
>
> I use an FEI Sirion SFEG which will do good work looking at
> photoresist on wafers or runners. It has a high magnetic field
> final lens. The Zeiss/LEO Supra 55VP that I have uses an
> electrostatic final lens and has no field at all at the pole
> piece. 200KX images at 1KV, 3mm WD and realized rez of 1.7nm.
> In VP mode, it does about 22nm. The Zeiss has all electronics
> in the column (plinth) unit. FEI has electronics in the column,
> user table and a separate expansion box. So space could be an
> issue.
>
> JEOL makes good SEMs but they seem to be more popular in the
> East than here in the West coast area. So service is an issue I
> think. FEI has good service all over as far as I know. Zeiss
> has some problems. Mostly understaffed.
>
> Gary Gaugler, Ph.D.
> Microtechnics, Inc.
> Granite Bay, CA 95746
> 916.791.8191
> gary@microtechnics dot com
Hello,
Thanks for all the information.
This will be used in a research setting so we will be looking at
samples of all sizes. 4" wafers will be about the largest size.
We must be able to accurately measure features that are 10 - 20 nm
wide and 30 - 40 nm high. The features are made out of polymers and
can not be coated. Other samples may be coated as necessary.
For this we would ideally like 1 nm resolution but 1.5 - 2 nm seems
like the best that we could get. I'm assuming that if we can get
the resolution we want for a polymer that other sample types would
be easier.
I think we want to stay away from cold FE for the reasons you
mentioned. I heard a rumor that JEOL will discontinue their cold
FE SEMs.
Since we want high resolution and magnification at low accelerating
voltage we will probably not get a VP machine.
How old is your FEI machine?
I know we would be able to get prompt service from JEOL or Hitachi.
I've never dealt with Zeiss.
The Zeiss sounds like a very nice machine. I have been told that
they have the best column design. No magnetic field could be
useful to look at MEMS devices. Are you happy with this machine?
Any annoying tendencies? Do you have a service contract?
Thanks
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